The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 27, 2012
Filed:
Apr. 26, 2007
Yoshiaki Sasaki, Nirasaki, JP;
Hirofumi Yamaguchi, Nirasaki, JP;
Yoshiaki Sasaki, Nirasaki, JP;
Hirofumi Yamaguchi, Nirasaki, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A substrate processing system includes a processing chamber, and an orientercentering a wafer W. The orienteris provided with an orienter sensormeasuring a central position discrepancy of the wafer W, and an image sensormeasuring a width of a non-film forming portion at circumferential portions of the wafer W. After a film deposition processing in the processing chamber, the wafer W is loaded into the orienterwhere a central position discrepancy of the wafer W is measured, and the wafer W is then centered. Further, the width of the non-film forming portion of the wafer W is measured, and a film position discrepancy is calculated based on the width of the non-film forming portion. To correct the calculated film position discrepancy, a target transfer position of the wafer W on a mounting tablein the processing chamberis adjusted.