The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 27, 2012
Filed:
May. 16, 2011
Sidlgata V. Sreenivasan, Austin, TX (US);
Byung-jin Choi, Austin, TX (US);
Norman E. Schumaker, Austin, TX (US);
Ronald D. Voisin, Fremont, CA (US);
Michael P. C. Watts, Austin, TX (US);
Mario Johannes Meissl, Austin, TX (US);
Sidlgata V. Sreenivasan, Austin, TX (US);
Byung-Jin Choi, Austin, TX (US);
Norman E. Schumaker, Austin, TX (US);
Ronald D. Voisin, Fremont, CA (US);
Michael P. C. Watts, Austin, TX (US);
Mario Johannes Meissl, Austin, TX (US);
Molecular Imprints, Inc., Austin, TX (US);
Abstract
The present invention is directed to methods for patterning a substrate by imprint lithography. Imprint lithography is a process in which a liquid is dispensed onto a substrate. A template is brought into contact with the liquid and the liquid is cured. The cured liquid includes an imprint of any patterns formed in the template. In one embodiment, the imprint process is designed to imprint only a portion of the substrate. The remainder of the substrate is imprinted by moving the template to a different portion of the template and repeating the imprint lithography process.