The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 13, 2012
Filed:
Nov. 02, 2009
Teruomi Minami, Kumamoto, JP;
Takashi Yabuta, Saga, JP;
Satoru Tanaka, Kumamoto, JP;
Hirotaka Maruyama, Koshi, JP;
Kouichi Eguchi, Tosu, JP;
Teruomi Minami, Kumamoto, JP;
Takashi Yabuta, Saga, JP;
Satoru Tanaka, Kumamoto, JP;
Hirotaka Maruyama, Koshi, JP;
Kouichi Eguchi, Tosu, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
Disclosed are a cleaning apparatus and a cleaning method, which can collect a chemical liquid without reducing the throughput after a substrate is subjected to a cleaning treatment and dried by using a drying solvent, such as IPA. The disclosed cleaning apparatus carries out a chemical liquid cleaning treatment, a rinsing treatment, and a drying treatment with IPA, in order, on a wafer W while rotating wafer W, and includes a cleaning liquid supply device for supplying a cleaning liquid for cleaning the drain cup and the drain tube to the drain cup in a state where the cleaning liquid is not supplied to the wafer. Also, the apparatus further includes a control unit for controlling respective components of the cleaning apparatus. The control unit, after the cleaning treatment and then the rinsing treatment of wafer W, at the time when the drying treatment is performed by IPA, controls the cleaning liquid to be supplied to the drain cup.