The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 09, 2012
Filed:
Mar. 14, 2008
Yu Zhu, Beijing, CN;
Ming Zhang, Beijing, CN;
Jinsong Wang, Beijing, CN;
Guang LI, Beijing, CN;
Dengfeng Xu, Beijing, CN;
Wensheng Yin, Beijing, CN;
Guanghong Duan, Beijing, CN;
Kaiming Yang, Beijing, CN;
Yu Zhu, Beijing, CN;
Ming Zhang, Beijing, CN;
Jinsong Wang, Beijing, CN;
Guang Li, Beijing, CN;
Dengfeng Xu, Beijing, CN;
Wensheng Yin, Beijing, CN;
Guanghong Duan, Beijing, CN;
Kaiming Yang, Beijing, CN;
Tsinghua University, Beijing, CN;
Abstract
A dual-stage switching system for lithographic machine includes a wafer stage to be operated in an exposure station and another wafer stage to be operated in a pre-processing station. The two wafer stages are provided on a base, with four 2-DOF driving units capable of moving along X direction and Y direction being provided along the edge of the base, and the wafer stages being disposed in a space surrounded by the four 2-DOF driving units and suspended on an upper surface of the base by air bearings. Each of the 2-DOF driving units includes upper and lower linear guides and a guiding sleeve, with the upper and lower linear guides being installed vertical to each other in their corresponding guiding sleeve. Two adjacent 2-DOF driving units cooperatively drive the wafer stage) to move in the X direction and Y direction.