The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 25, 2012
Filed:
Mar. 17, 2011
Applicants:
Keiichi Tanaka, Chiba, JP;
Yo Yamamoto, Chiba, JP;
Xin Man, Chiba, JP;
Junichi Tashiro, Chiba, JP;
Toshiaki Fujii, Chiba, JP;
Inventors:
Keiichi Tanaka, Chiba, JP;
Yo Yamamoto, Chiba, JP;
Xin Man, Chiba, JP;
Junichi Tashiro, Chiba, JP;
Toshiaki Fujii, Chiba, JP;
Assignee:
SII NanoTechnology Inc., , JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/66 (2006.01);
U.S. Cl.
CPC ...
Abstract
There is provided a sample processing and observing method including irradiating a focused ion beam to a sample to form an observed surface, irradiating an electron beam to the observed surface to form an observed image, removing the surface opposite to the observed surface of the sample, forming a lamella including the observed surface and obtaining a transmission observed image for the lamella.