The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 25, 2012

Filed:

Aug. 07, 2009
Applicants:

Yoshihiko Naito, Tokyo, JP;

Norio Kimura, Tokyo, JP;

Kenji Terao, Tokyo, JP;

Masahiro Hatakeyama, Tokyo, JP;

Masamitsu Itoh, Kanagawa, JP;

Inventors:

Yoshihiko Naito, Tokyo, JP;

Norio Kimura, Tokyo, JP;

Kenji Terao, Tokyo, JP;

Masahiro Hatakeyama, Tokyo, JP;

Masamitsu Itoh, Kanagawa, JP;

Assignees:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 23/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A substrate surface inspection method inspects for a defect on a substrate including a plurality of materials on a surface thereof. The inspection method comprises: irradiating the surface of the substrate with an electron beam, a landing energy of the electron beam set such that a contrast between at least two types of materials of the plurality of materials is within a predetermined range; detecting electrons generated by the substrate to acquire a surface image of the substrate, with a pattern formed thereon from the at least two types of materials eliminated or weakened; and detecting the defect from the acquired surface image by detecting as the defect an object image having a contrast by which the object image can be distinguished from a background image in the surface image. Defects present on the substrate surface can be detected easily and precisely by using a cell inspection.


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