The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 25, 2012
Filed:
Oct. 02, 2008
Caizhong Tian, Amagasaki, JP;
Kiyotaka Ishibashi, Amagasaki, JP;
Toshihisa Nozawa, Amagasaki, JP;
Tokyo Electron Limited, , JP;
Abstract
In the plasma processing apparatus, microwaves supplied from a coaxial waveguideare introduced into a processing containervia a wavelength-shortening plate, a process gas is plasmatized in the processing container, and a substrate W is processed using the plasma. In the plasma processing apparatus, a dielectric memberis disposed at a connecting area between the coaxial waveguideand the wavelength-shortening plate. Inside an outer conductorof the coaxial waveguide, the dielectric memberis disposed to surround a part of a circumference of an inner conductorof the coaxial waveguide, and is disposed at any position around the circumference of the inner conductor