The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 18, 2012
Filed:
Sep. 21, 2009
Marcus Martinus Petrus Adrianus Vermeulen, Leende, NL;
Andre Bernardus Jeunink, Bergeijk, NL;
Erik Roelof Loopstra, Eindhoven, NL;
Joost Jeroen Ottens, Veldhoven, NL;
Rene Theodorus Petrus Compen, Valkenswaard, NL;
Peter Smits, Baarlo, NL;
Martijn Houben, 's-Hertogenbosch, NL;
Hendrikus Johannes Marinus Van Abeelen, Moergestel, NL;
Antonius Arnoldus Meulendijks, Arendonk, BE;
Rene Wilhelmus Antonius Hubertus Leenaars, Eindhoven, NL;
Marcus Martinus Petrus Adrianus Vermeulen, Leende, NL;
Andre Bernardus Jeunink, Bergeijk, NL;
Erik Roelof Loopstra, Eindhoven, NL;
Joost Jeroen Ottens, Veldhoven, NL;
Rene Theodorus Petrus Compen, Valkenswaard, NL;
Peter Smits, Baarlo, NL;
Martijn Houben, 's-Hertogenbosch, NL;
Hendrikus Johannes Marinus Van Abeelen, Moergestel, NL;
Antonius Arnoldus Meulendijks, Arendonk, BE;
Rene Wilhelmus Antonius Hubertus Leenaars, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a mirror block provided with a substrate table constructed to hold a substrate; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate, wherein the mirror block is constructed and arranged to reduce slip between the mirror block and the substrate table. Slip can occur if the acceleration of the mirror block is high and the substrate table slips locally with respect to the mirror block. Slip may lead to exposure errors since the position of the substrate is no longer determined with the desired accuracy.