The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 11, 2012
Filed:
Feb. 23, 2009
Arie Jeffrey Den Boef, Waalre, NL;
Everhardus Cornelis Mos, Best, NL;
Maurits Van Der Schaar, Veldhoven, NL;
Stefan Carolus Jacobus Antonius Keij, Breda, NL;
Arie Jeffrey Den Boef, Waalre, NL;
Everhardus Cornelis Mos, Best, NL;
Maurits Van Der Schaar, Veldhoven, NL;
Stefan Carolus Jacobus Antonius Keij, Breda, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic apparatus arranged to transfer a pattern from a patterning device onto a substrate includes a reference set of gratings provided in the substrate, the reference set including two reference gratings having line elements in a first direction and one reference grating having line elements in a second, perpendicular, direction. A measurement set of gratings is provided on top of the reference set of gratings, the measurement set comprising three measurement gratings similar to the reference gratings. Two of the measurement gratings are oppositely biased in the second direction relative to the respective reference gratings. An overlay measurement device is provided to measure asymmetry of the three gratings in the reference set and the measurement set, and to derive from the measured asymmetry the overlay in both the first and second direction.