The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 28, 2012
Filed:
Oct. 13, 2009
Chin-cheng Chien, Tainan Hsien, TW;
Chan-lon Yang, Taipei, TW;
Chiu-hsien Yeh, Tainan, TW;
Che-hua Hsu, Hsinchu County, TW;
Zhi-cheng Lee, Tainan, TW;
Shao-hua Hsu, Taoyuan County, TW;
Cheng-guo Chen, Changhua County, TW;
Shin-chi Chen, Tainan County, TW;
Zhi-jian Wang, Tainan, TW;
Chin-Cheng Chien, Tainan Hsien, TW;
Chan-Lon Yang, Taipei, TW;
Chiu-Hsien Yeh, Tainan, TW;
Che-Hua Hsu, Hsinchu County, TW;
Zhi-Cheng Lee, Tainan, TW;
Shao-Hua Hsu, Taoyuan County, TW;
Cheng-Guo Chen, Changhua County, TW;
Shin-Chi Chen, Tainan County, TW;
Zhi-Jian Wang, Tainan, TW;
United Microelectronics Corp., Science-Based Industrial Park, Hsin-Chu, TW;
Abstract
A method for removing a photoresist is disclosed. First, a substrate including a patterned photoresist is provided. Second, an ion implantation is carried out on the substrate. Then, a non-oxidative pre-treatment is carried out on the substrate. The non-oxidative pre-treatment provides hydrogen, a carrier gas and plasma. Later, a photoresist-stripping step is carried out so that the photoresist can be completely removed.