The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 07, 2012

Filed:

Apr. 22, 2008
Applicants:

Robert Kazinczi, Helmond, NL;

Wim Tjibbo Tel, Helmond, NL;

Laurentius Cornelius DE Winter, Vessem, NL;

Inventors:

Robert Kazinczi, Helmond, NL;

Wim Tjibbo Tel, Helmond, NL;

Laurentius Cornelius De Winter, Vessem, NL;

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03B 27/68 (2006.01); G03B 27/42 (2006.01); G03B 27/54 (2006.01); G03B 27/32 (2006.01); G03B 27/52 (2006.01);
U.S. Cl.
CPC ...
Abstract

A lithographic method is provided that includes using an illumination system to provide a beam of radiation having an illumination mode, using a patterning device to impart the radiation beam with a pattern in its cross-section, and projecting the patterned radiation beam onto a substrate. The illumination mode is adjusted after the radiation beam has been projected onto the substrate. The adjustment is arranged to reduce the effect of optical aberrations due to lens heating on the projected pattern during projection of the pattern onto a subsequent substrate.


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