The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 24, 2012
Filed:
Jun. 13, 2011
Timothy Allan Brunner, Ridgefield, CT (US);
Sean David Burns, Hopewell Junction, NY (US);
Kuang-jung Chen, Poughkeepsie, NY (US);
Wu-song Huang, Brewster, NY (US);
Kafai Lai, Poughkeepsie, NY (US);
Wai-kin LI, Beacon, NY (US);
Bernhard R. Liegl, Beacon, NY (US);
Timothy Allan Brunner, Ridgefield, CT (US);
Sean David Burns, Hopewell Junction, NY (US);
Kuang-Jung Chen, Poughkeepsie, NY (US);
Wu-Song Huang, Brewster, NY (US);
Kafai Lai, Poughkeepsie, NY (US);
Wai-Kin Li, Beacon, NY (US);
Bernhard R. Liegl, Beacon, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
An anti-reflective coating material, a microelectronic structure that includes an anti-reflective coating layer formed from the anti-reflective coating material and a related method for exposing a resist layer located over a substrate while using the anti-reflective coating layer provide for attenuation of secondary reflected vertical alignment beam radiation when aligning the substrate including the resist layer located thereover. Such enhanced vertical alignment provides for improved dimensional integrity of a patterned resist layer formed from the resist layer, as well as additional target layers that may be fabricated while using the resist layer as a mask.