The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 03, 2012
Filed:
May. 31, 2006
Andrew D. Bailey, Iii, Pleasanton, CA (US);
Shrikant P. Lohokare, Fremont, CA (US);
Arthur M. Howald, Pleasanton, CA (US);
Yunsang Kim, San Jose, CA (US);
Andrew D. Bailey, III, Pleasanton, CA (US);
Shrikant P. Lohokare, Fremont, CA (US);
Arthur M. Howald, Pleasanton, CA (US);
Yunsang Kim, San Jose, CA (US);
Lam Research Corporation, Fremont, CA (US);
Abstract
A method for cleaning a processing chamber that includes heating an inner surface of the processing chamber to a first temperature. The first temperature can be sufficient to cause a first species to become volatile. The first species can be one of several species deposited on the inner surface. A cleaning chemistry is injected into the processing chamber. The cleaning chemistry can be reactive with a second one of the species to convert the second species to the first species. The volatilized first species can also be output from the processing chamber. A system for cleaning the process chamber is also described.