The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 12, 2012
Filed:
Nov. 03, 2011
Jui-chung Peng, Hsin-Chu, TW;
Tzung-chi Fu, Maioli, TW;
Chin-hsiang Lin, Hsin-Chu, TW;
Chien-hsun Lin, Hsinchu, TW;
Chun-hung Lin, Taoyuan, TW;
Yao-wen Guo, Chaojhou Township, Pingtung County, TW;
Shy-jay Lin, Jhundong Township, Hsinchu County, TW;
Heng-hsin Liu, Yonghe, TW;
Jui-Chung Peng, Hsin-Chu, TW;
Tzung-Chi Fu, Maioli, TW;
Chin-Hsiang Lin, Hsin-Chu, TW;
Chien-Hsun Lin, Hsinchu, TW;
Chun-Hung Lin, Taoyuan, TW;
Yao-Wen Guo, Chaojhou Township, Pingtung County, TW;
Shy-Jay Lin, Jhundong Township, Hsinchu County, TW;
Heng-Hsin Liu, Yonghe, TW;
Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;
Abstract
System and method for improving immersion scanner overlay performance are described. One embodiment is a method of improving overlay performance of an photolithography immersion scanner including a wafer table having lens cooling water ('LCW') disposed in a water channel therein, the wafer table having an input for receiving the LCW into the water channel and an output for expelling the LCW from the water channel. The method includes providing a water tank that connects to at least one of the wafer table input and the wafer table output; monitoring a pressure of water in the water tank; and maintaining the pressure of the water in the water tank at a predetermined level.