The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 08, 2012
Filed:
Mar. 05, 2010
Tomoyuki Kudo, Miyagi-gun, JP;
Jun Ozawa, Nirasaki, JP;
Hiroshi Nakamura, Nirasaki, JP;
Kazunori Kazama, Nirasaki, JP;
Tsuyoshi Moriya, Nirasaki, JP;
Hiroyuki Nakayama, Nirasaki, JP;
Hiroshi Nagaike, Nirasaki, JP;
Tomoyuki Kudo, Miyagi-gun, JP;
Jun Ozawa, Nirasaki, JP;
Hiroshi Nakamura, Nirasaki, JP;
Kazunori Kazama, Nirasaki, JP;
Tsuyoshi Moriya, Nirasaki, JP;
Hiroyuki Nakayama, Nirasaki, JP;
Hiroshi Nagaike, Nirasaki, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A computer readable storage medium storing a program for performing an operation method of a substrate processing apparatus is provided. The operation method includes the steps of introducing a nonreactive gas into the vacuum preparation chamber before the gate valve is opened while the substrate is transferred between the vacuum preparation chamber of the vacuum processing unit and the transfer unit, stopping introducing the nonreactive gas when an inner pressure of the vacuum preparation chamber becomes same as an atmospheric pressure, starting an evacuation process of the corrosive gas in the vacuum preparation chamber and then opening to atmosphere performed by letting the vacuum preparation chamber communicate with an atmosphere, and opening the gate valve after the step of opening to atmosphere.