The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 24, 2012
Filed:
Jun. 05, 2009
Saravanan Paramasivam, Rajakilpakkam, IN;
Patrick Y. Huet, San Jose, CA (US);
Martin Plihal, Pleasanton, CA (US);
Luc Debarge, Dresden, DE;
Saravanan Paramasivam, Rajakilpakkam, IN;
Patrick Y. Huet, San Jose, CA (US);
Martin Plihal, Pleasanton, CA (US);
Luc Debarge, Dresden, DE;
KLA-Tencor Corporation, Milpitas, CA (US);
Abstract
A computerized method for categorizing defects on a substrate. A list of defects on the substrate is received as input to a processor, where each defect is represented by a defect location and an associated micro-defect code. The input is analyzed with the processor to detect spatial clusters of defects on the substrate. The spatial clusters are analyzed with the processor to determine which of the spatial clusters represent known macro-defects and which of the spatial clusters represent unknown macro-defects. The micro-defect code associated with each defect that is included in one of the spatial clusters that is determined to be a known macro-defect is changed with the processor with a macro-defect code that is associated solely with the known macro-defect. The processor analyzes the defects that are included in one of the spatial clusters that is determined to be an unknown macro-defect to determine a predominantly occurring micro-defect code. The processor changes the micro-defect code associated with each defect that is included in the one spatial cluster that is determined to be an unknown macro-defect with the predominantly-occurring micro-defect code. The processor sends the changed list of defects on the substrate as output.