The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 20, 2012
Filed:
Apr. 26, 2005
Krishna Shrinivasan, San Jose, CA (US);
Feng Wang, Fremont, CA (US);
George Kamian, Scotts Valley, CA (US);
Steve Gentile, Sunnyvale, CA (US);
Mark Yam, Monte Sereno, CA (US);
Krishna Shrinivasan, San Jose, CA (US);
Feng Wang, Fremont, CA (US);
George Kamian, Scotts Valley, CA (US);
Steve Gentile, Sunnyvale, CA (US);
Mark Yam, Monte Sereno, CA (US);
Novellus Systems, Inc., San Jose, CA (US);
Abstract
The present invention relates to curing of semiconductor wafers. More particularly, the invention relates to cure chambers containing multiple cure stations, each featuring one or more UV light sources. The wafers are cured by sequential exposure to the light sources in each station. In some embodiments, the wafers remain stationary with respect to the light source during exposure. In other embodiments, there is relative movement between the light source and the wafer during exposure. The invention also provides chambers that may be used to independently modulate the cross-linking, density and increase in stress of a cured material by providing independent control of the wafer temperature and UV intensity.