The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 28, 2012
Filed:
Apr. 10, 2008
Applicants:
Vishwanath Bhat, Boise, ID (US);
Dan Gealy, Kuna, ID (US);
Vassil Antonov, Boise, ID (US);
Inventors:
Assignee:
Micron Technology, Inc., Boise, ID (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/44 (2006.01);
U.S. Cl.
CPC ...
Abstract
Methods for forming ruthenium films and semiconductor devices such as capacitors that include the films are provided.
Quick Actions:
Bhat, Vishwanath. (2012). Method for forming a ruthenium film (U.S. Patent No. 8124528). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8124528
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile