The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 8120767 B1

PDF
Full Text
Expired
Date of Patent:
Feb. 21, 2012

Filed:

Mar. 13, 2008
Applicants:

Chih-chiang Tu, Tauyen, TW;

Chien-chao Huang, Hsin-Chu, TW;

Inventors:

Chih-Chiang Tu, Tauyen, TW;

Chien-Chao Huang, Hsin-Chu, TW;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 21/00 (2006.01); G06K 9/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

The present disclosure provide a method for making a mask. The method includes assigning a plurality of pattern features to different data types; writing the plurality of pattern features on a mask; inspecting the plurality of pattern features with different inspection sensitivities according to assigned data types; and repairing the plurality of pattern features on the mask according to the inspecting of the plurality of pattern features.


Find Patent Forward Citations

Tu, Chih-Chiang. (2012). Mask making decision for manufacturing (dfm) on mask quality control (U.S. Patent No. 8120767). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8120767

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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