The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 21, 2012
Filed:
Aug. 07, 2009
Applicants:
Hsiao-tzu LU, Hsin-Chu, TW;
Chin-hsiang Lin, Hsin-chu, TW;
Hua-shu Wu, Hsin-Chu, TW;
Chia-hsiang Lin, Hsin-Chu, TW;
Kuei Shun Chen, Hsin-Chu, TW;
Inventors:
Hsiao-Tzu Lu, Hsin-Chu, TW;
Chin-Hsiang Lin, Hsin-chu, TW;
Hua-Shu Wu, Hsin-Chu, TW;
Chia-Hsiang Lin, Hsin-Chu, TW;
Kuei Shun Chen, Hsin-Chu, TW;
Assignee:
Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01J 1/42 (2006.01); H01L 23/544 (2006.01); H01L 21/76 (2006.01);
U.S. Cl.
CPC ...
Abstract
Provided is a system for overlay measurement in semiconductor manufacturing that includes a generator for exposing an overlay target to radiation and a detector for detecting reflected beams of the overlay target. The reflected beams are for overlay measurement and include at least two different beams.