The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 07, 2012
Filed:
May. 30, 2008
Michael Adel, Zirchron Yaakov, IL;
John Fielden, Los Altos, CA (US);
Amir Widmann, Sunnyvale, CA (US);
John Robinson, Austin, TX (US);
Dongsub Choi, Yongin, KR;
Michael Adel, Zirchron Yaakov, IL;
John Fielden, Los Altos, CA (US);
Amir Widmann, Sunnyvale, CA (US);
John Robinson, Austin, TX (US);
Dongsub Choi, Yongin, KR;
KLA-TENCOR Corporation, San Jose, CA (US);
Abstract
A method and apparatus for process control in a lithographic process are described. Metrology may be performed on a substrate either before or after performing a lithographic patterning process on the substrate. One or more correctables to the lithographic patterning process may be generated based on the metrology. The lithographic patterning process performed on the substrate (or a subsequent substrate) may be adjusted with the correctables.