The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 31, 2012
Filed:
Nov. 14, 2006
Yasuyoshi Hyodo, Tama, JP;
Kazuo Kohmura, Sodegaura, JP;
Nobutoshi Fujii, Chigasaki, JP;
Nobutaka Kunimi, Osaka, JP;
Keizo Kinoshita, Tokyo, JP;
Yasuyoshi Hyodo, Tama, JP;
Kazuo Kohmura, Sodegaura, JP;
Nobutoshi Fujii, Chigasaki, JP;
Nobutaka Kunimi, Osaka, JP;
Keizo Kinoshita, Tokyo, JP;
ASM Japan K.K., Tama-shi, Tokyo, JP;
Ulvac, Inc., Chihasaki-shi, Kanagawa, JP;
NEC Corporation, Tokyo, JP;
Abstract
A method of forming a porous film on a processing target includes: forming fine organic particles by polymerizing an organic compound in a gaseous phase; mixing the fine organic particles with a silicon compound containing a Si—O bond in a gaseous phase, thereby depositing a film containing the fine particles on the processing target; and removing the fine organic particles from the film.