The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 24, 2012
Filed:
May. 09, 2007
Ching-yu Chang, Yilang County, TW;
Heng-jen Lee, Baoshan Township, Hsinchu County, TW;
Chin-hsiang Lin, Hsin-chu, TW;
Hua-tai Lin, HsinChu, TW;
Kuei Shun Chen, Hsin-Chu, TW;
Bang-chein Ho, Jhudong Township, Hsinchu County, TW;
Li-kong Turn, Hsin-Chu, TW;
Hung-jui Kuo, Hsinchu, TW;
Ko-bin Kao, Shengang Township, Taichung County, TW;
Tsung-chih Chien, Caotun Township, Nantou County, TW;
Ching-Yu Chang, Yilang County, TW;
Heng-Jen Lee, Baoshan Township, Hsinchu County, TW;
Chin-Hsiang Lin, Hsin-chu, TW;
Hua-Tai Lin, HsinChu, TW;
Kuei Shun Chen, Hsin-Chu, TW;
Bang-Chein Ho, Jhudong Township, Hsinchu County, TW;
Li-Kong Turn, Hsin-Chu, TW;
Hung-Jui Kuo, Hsinchu, TW;
Ko-Bin Kao, Shengang Township, Taichung County, TW;
Tsung-Chih Chien, Caotun Township, Nantou County, TW;
Abstract
A method of inhibiting photoresist pattern collapse which includes the steps of providing a substrate; providing a photoresist layer on the substrate; exposing and developing the photoresist layer; applying a top anti-reflective coating layer to the photoresist layer; rinsing the photoresist layer; and drying the photoresist layer.