The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 17, 2012
Filed:
Mar. 26, 2010
Martin D. Tabat, Nashua, NH (US);
Matthew C. Gwinn, Winchendon, MA (US);
Robert K. Becker, Danvers, MA (US);
Avrum Freytsis, Salem, MA (US);
Michael Graf, Belmont, MA (US);
Martin D. Tabat, Nashua, NH (US);
Matthew C. Gwinn, Winchendon, MA (US);
Robert K. Becker, Danvers, MA (US);
Avrum Freytsis, Salem, MA (US);
Michael Graf, Belmont, MA (US);
TEL Epion Inc., Billerica, MA (US);
Abstract
A gas cluster ion beam (GCIB) processing system using multiple nozzles for forming and emitting at least one GCIB and methods of operating thereof are described. The GCIB processing system may be configured to treat a substrate, including, but not limited to, doping, growing, depositing, etching, smoothing, amorphizing, or modifying a layer thereupon. Furthermore, the GCIB processing system may be operated to produce a first GCIB and a second GCIB, and to irradiate a substrate simultaneously and/or sequentially with the first GCIB and second GCIB.