The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 8076243 B1

PDF
Full Text
Expired
Date of Patent:
Dec. 13, 2011

Filed:

Jan. 26, 2010
Applicants:

Christian Dussarrat, Wilmington, DE (US);

Clement Lansalot-matras, Ibaraki-Pref., JP;

Vincent M. Omarjee, Bear, DE (US);

Cheng-fang Hsiao, Tsukuba, JP;

Inventors:

Christian Dussarrat, Wilmington, DE (US);

Clement Lansalot-Matras, Ibaraki-Pref., JP;

Vincent M. Omarjee, Bear, DE (US);

Cheng-Fang Hsiao, Tsukuba, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 23/48 (2006.01);
U.S. Cl.
CPC ...
Abstract

Compositions and methods for forming a metal-containing thin film on a substrate. A reactor and at least one substrate in the reactor are provided. A metal-containing bis-β-diketiminate precursor is introduced into the reactor. The reactor is maintained at a set temperature and pressure, and the precursor is contacted with the substrate to form a metal-containing film on the substrate.


Find Patent Forward Citations

Dussarrat, Christian. (2011). Metal precursors for deposition of metal-containing films (U.S. Patent No. 8076243). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8076243

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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