The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 15, 2011
Filed:
Feb. 05, 2007
Masanobu Honda, Nirasaki, JP;
Yutaka Matsui, Nirasaki, JP;
Masanobu Honda, Nirasaki, JP;
Yutaka Matsui, Nirasaki, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A method of cleaning a substrate processing chamber that enables formation of an oxide film on a surface of a processing chamber inside component to be prevented. A substrate processing chamberhas therein a processing space S into which a wafer W is transferred and carries out reactive ion etching on the wafer W in the processing space S. The substrate processing chamberhas an upper electrode platethat comprises silicon and a lower surface of which is exposed to the processing space S. A dry cleaning is carried out on the upper electrode plateusing oxygen radicals produced from oxygen gas introduced into the processing space S. An oxide removal processing is carried out on the upper electrode plateusing fluorine ions and fluorine radicals produced from carbon tetrafluoride gas introduced into the processing space S.