The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 08, 2011
Filed:
Mar. 02, 2010
Ulrich Loering, Oberkochen, DE;
Vladan Blahnik, Aalen, DE;
Wilhelm Ulrich, Aalen, DE;
Daniel Kraehmer, Essingen, DE;
Norbert Wabra, Werneck, DE;
Ulrich Loering, Oberkochen, DE;
Vladan Blahnik, Aalen, DE;
Wilhelm Ulrich, Aalen, DE;
Daniel Kraehmer, Essingen, DE;
Norbert Wabra, Werneck, DE;
Carl Zeiss SMT GmbH, Oberkochen, DE;
Abstract
Projection objectives, as well as related components, systems and methods, are disclosed. In general, a projection objective is configured to image radiation from an object plane to an image plane. A projection objective can include a plurality of optical elements along the optical axis. The plurality of optical elements can include a group of optical elements and a last optical element which is closest to the image plane, and a positioning device configured to move the last optical element relative to the image plane. Typically, a projection objective is configured to be used in a microlithography projection exposure machine.