The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 01, 2011
Filed:
Oct. 31, 2007
Tadashi Kontani, Tokyo, JP;
Kazuyuki Toyoda, Tokyo, JP;
Taketoshi Sato, Tokyo, JP;
Toru Kagaya, Tokyo, JP;
Nobuhito Shima, Tokyo, JP;
Nobuo Ishimaru, Tokyo, JP;
Masanori Sakai, Tokyo, JP;
Kazuyuki Okuda, Tokyo, JP;
Yasushi Yagi, Tokyo, JP;
Seiji Watanabe, Tokyo, JP;
Yasuo Kunii, Tokyo, JP;
Tadashi Kontani, Tokyo, JP;
Kazuyuki Toyoda, Tokyo, JP;
Taketoshi Sato, Tokyo, JP;
Toru Kagaya, Tokyo, JP;
Nobuhito Shima, Tokyo, JP;
Nobuo Ishimaru, Tokyo, JP;
Masanori Sakai, Tokyo, JP;
Kazuyuki Okuda, Tokyo, JP;
Yasushi Yagi, Tokyo, JP;
Seiji Watanabe, Tokyo, JP;
Yasuo Kunii, Tokyo, JP;
Hitachi Kokusai Electric Inc., Tokyo, JP;
Abstract
A substrate processing apparatus comprises a reaction chamber which is to accommodate stacked substrates, a gas introducing portion, and a buffer chamber, wherein the gas introducing portion is provided along a stacking direction of the substrates, and introduces substrate processing gas into the buffer chamber, the buffer chamber includes a plurality of gas-supply openings provided along the stacking direction of the substrates, and the processing gas introduced from the gas introducing portion is supplied from the gas-supply openings to the reaction chamber.