The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 11, 2011
Filed:
Jul. 01, 2008
Ralf Richter, Dresden, DE;
Michael Finken, Dresden, DE;
Joerg Hohage, Dresden, DE;
Heike Salz, Radebeul, DE;
Ralf Richter, Dresden, DE;
Michael Finken, Dresden, DE;
Joerg Hohage, Dresden, DE;
Heike Salz, Radebeul, DE;
Advanced Micro Devices, Inc., Austin, TX (US);
Abstract
By forming a buffer material above differently stressed contact etch stop layers followed by the deposition of a further stress-inducing material, enhanced overall device performance may be accomplished, wherein an undesired influence of the additional stress-inducing layer may be reduced in device regions, for instance, by removing the additional material or by performing a relaxation implantation process. Furthermore, process uniformity during a patterning sequence for forming contact openings may be enhanced by partially removing the additional stress-inducing layer at an area at which a contact opening is to be formed.