The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 27, 2011
Filed:
Jan. 28, 2011
Matthew Lipson, Stamford, CT (US);
Marcel Mathijs Theodore Marie Dierichs, Venlo, NL;
Sjoerd Nicolaas Lambertus Donders, ′s-Hertogenbosch, NL;
Johannes Catharinus Hubertus Mulkens, Waalre, NL;
Bob Streefkerk, Tilburg, NL;
Ronald Wilklow, Fairfield, CT (US);
Roel DE Jonge, Veldhoven, NL;
Matthew Lipson, Stamford, CT (US);
Marcel Mathijs Theodore Marie Dierichs, Venlo, NL;
Sjoerd Nicolaas Lambertus Donders, ′s-Hertogenbosch, NL;
Johannes Catharinus Hubertus Mulkens, Waalre, NL;
Bob Streefkerk, Tilburg, NL;
Ronald Wilklow, Fairfield, CT (US);
Roel De Jonge, Veldhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
ASML Holding N.V., Veldhoven, NL;
Abstract
A method including mixing using a mixer a first component and a second component to form a liquid before supply to a space between the projection system and a substrate, measuring a property of the liquid using a measuring device and making the feedback available to a controller, based on the feedback, controlling with the controller a physical property of the liquid by controlling the amount of the first and/or second component used to form the liquid, supplying the liquid to the space between the projection system and the substrate, and projecting a patterned beam of radiation, using the projection system, through the liquid onto a target portion of the substrate.