The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 06, 2011
Filed:
Sep. 11, 2007
Kenji Watanabe, Tokyo, JP;
Takeshi Murakami, Tokyo, JP;
Ryo Tajima, Fujisawa, JP;
Masahiro Hatakeyama, Tokyo, JP;
Masatoshi Tsuneoka, Tokyo, JP;
Nobuharu Noji, Tokyo, JP;
Kenji Watanabe, Tokyo, JP;
Takeshi Murakami, Tokyo, JP;
Ryo Tajima, Fujisawa, JP;
Masahiro Hatakeyama, Tokyo, JP;
Masatoshi Tsuneoka, Tokyo, JP;
Nobuharu Noji, Tokyo, JP;
Ebara Corporation, Tokyo, JP;
Abstract
A charged particle beam apparatusfor observing and estimating a sample W by applying a charged particle beam to sample W to detect secondary charged particles, such as electrons emitted from the sample, reflected electrons and backscattered electrons comprises astigmatism adjusting meansfor adjusting astigmatism of the charged particle beam. Astigmatism adjusting meansis supplied with a correction voltage which maximizes a focal estimation value obtained from a pattern formed on sample W. Astigmatism adjusting meansis a multipole including a plurality of pairs of electrodes or coils facing each other to place the optical axis of the charged particle beam at the center. Also disclosed is a charged particle beam apparatuscapable of observation and estimation of a sample surface in a condition where no charge up exists over the whole sample W.