The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 06, 2011

Filed:

Jan. 31, 2008
Applicants:

Masahiro Watanabe, Yokohama, JP;

Toru Kurenuma, Tsuchiura, JP;

Hiroshi Kuroda, Kasumigaura, JP;

Takafumi Morimoto, Abiko, JP;

Shuichi Baba, Yokohama, JP;

Toshihiko Nakata, Hiratsuka, JP;

Manabu Edamura, Kasumigaura, JP;

Yukio Kembo, Tokyo, JP;

Inventors:

Masahiro Watanabe, Yokohama, JP;

Toru Kurenuma, Tsuchiura, JP;

Hiroshi Kuroda, Kasumigaura, JP;

Takafumi Morimoto, Abiko, JP;

Shuichi Baba, Yokohama, JP;

Toshihiko Nakata, Hiratsuka, JP;

Manabu Edamura, Kasumigaura, JP;

Yukio Kembo, Tokyo, JP;

Assignee:

Hitachi, Ltd., Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B 5/28 (2006.01);
U.S. Cl.
CPC ...
Abstract

A scanning probe microscope, capable of performing shape measurement not affected by electrostatic charge distribution of a sample, which: monitors an electrostatic charge state by detecting a change in a flexure or vibrating state of a cantilever due to electrostatic charges in synchronization with scanning during measurement with relative scanning between the probe and the sample, and makes potential adjustment so as to cancel an influence of electrostatic charge distribution, thus preventing damage of the probe or the sample due to discharge and achieving reduction in measurement errors due to electrostatic charge distribution.


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