The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 23, 2011
Filed:
Dec. 16, 2008
Du-hyun Cho, Gyeonggi-do, KR;
Jong-heui Song, Gyeonggi-do, KR;
Sang-sup Jeong, Gyeonggi-do, KR;
Tae-woo Kang, Gyeonggi-do, KR;
Seung-joo Yoo, Seoul, KR;
Du-Hyun Cho, Gyeonggi-do, KR;
Jong-Heui Song, Gyeonggi-do, KR;
Sang-Sup Jeong, Gyeonggi-do, KR;
Tae-Woo Kang, Gyeonggi-do, KR;
Seung-Joo Yoo, Seoul, KR;
Abstract
In methods of forming a trench, first patterns separated from each other by a first width and second patterns separated from each other by a second width are formed on a substrate. The second width is wider than the first width. The substrate is etched using the first patterns and the second patterns to form a first trench having a first depth and a preliminary second trench having a second depth. A sacrificial layer is formed to fill up a space between the first patterns. The substrate is etched using the sacrificial layer to form a second trench having a third depth deeper than the second depth.