The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 23, 2011

Filed:

May. 29, 2008
Applicants:

Steven C. Shannon, Raleigh, NC (US);

Kartik Ramaswamy, San Jose, CA (US);

Daniel J. Hoffman, Saratoga, CA (US);

Matthew L. Miller, Fremont, CA (US);

Kenneth S. Collins, San Jose, CA (US);

Inventors:

Steven C. Shannon, Raleigh, NC (US);

Kartik Ramaswamy, San Jose, CA (US);

Daniel J. Hoffman, Saratoga, CA (US);

Matthew L. Miller, Fremont, CA (US);

Kenneth S. Collins, San Jose, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23F 1/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method is provided in plasma processing of a workpiece for stabilizing the plasma against engineered transients in applied RF power, by modulating an unmatched low power RF generator in synchronism with the transient.


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