The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 16, 2011
Filed:
Mar. 17, 2009
Rajinder Dhindsa, San Jose, CA (US);
Eric Lenz, Pleasanton, CA (US);
Lumin LI, Santa Clara, CA (US);
Felix Kozakevich, Sunnyvale, CA (US);
Rajinder Dhindsa, San Jose, CA (US);
Eric Lenz, Pleasanton, CA (US);
Lumin Li, Santa Clara, CA (US);
Felix Kozakevich, Sunnyvale, CA (US);
Lam Research Corporation, Fremont, CA (US);
Abstract
An electrostatic chuck assembly having a dielectric material and/or having a cavity with varying thickness, profile and/or shape is disclosed. The electrostatic chuck assembly includes a conductive support and an electrostatic chuck ceramic layer. A dielectric layer or insert is located between the conductive support and an electrostatic chuck ceramic layer. A cavity is located in a seating surface of the electrostatic chuck ceramic layer. An embedded pole pattern can be optionally incorporated in the electrostatic chuck assembly. Methods of manufacturing the electrostatic chuck assembly are disclosed as are methods to improve the uniformity of a flux field above a workpiece during a plasma processing process.