The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 16, 2011
Filed:
Apr. 27, 2005
Chia-jen Chen, Hsinchu, TW;
Hsin-chang Lee, Hsinchu, TW;
Sheng-chi Chin, Hsin-Chu, TW;
Hung Chang Hsieh, HsinChu, TW;
Burn Jeng Lin, Hsin-Chu, TW;
Chia-Jen Chen, Hsinchu, TW;
Hsin-Chang Lee, Hsinchu, TW;
Sheng-Chi Chin, Hsin-Chu, TW;
Hung Chang Hsieh, HsinChu, TW;
Burn Jeng Lin, Hsin-Chu, TW;
Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;
Abstract
The present disclosure provides a system and method for manufacturing a mask for semiconductor processing. In one example, the system includes at least one exposure unit configured to select a recipe for a later baking process in a post treatment unit, a buffer unit coupled to the exposure unit and configured to move the mask substrate from the exposure unit to the post treatment unit without exposing the mask substrate to the environment; and the post treatment unit coupled to the buffer unit and the exposure unit and configured to perform a baking process on the mask substrate using baking parameters associated with the recipe selected by the exposure unit.