The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 09, 2011
Filed:
Aug. 21, 2008
Woo-yeong Cho, Hwaseong-si, KR;
Du-eung Kim, Yongin-si, KR;
Yun-seung Shin, Seoul, KR;
Hyun-geun Byun, Yongin-si, KR;
Sang-beom Kang, Hwaseong-si, KR;
Beak-hyung Cho, Hwaseong-si, KR;
Choong-keun Kwak, Suwon-si, KR;
Woo-Yeong Cho, Hwaseong-si, KR;
Du-Eung Kim, Yongin-si, KR;
Yun-Seung Shin, Seoul, KR;
Hyun-Geun Byun, Yongin-si, KR;
Sang-Beom Kang, Hwaseong-si, KR;
Beak-Hyung Cho, Hwaseong-si, KR;
Choong-Keun Kwak, Suwon-si, KR;
Samsung Electronics Co., Ltd., Maetan-dong, Yeongtong-gu, Suwon-si, Gyeonggi-do, KR;
Abstract
Phase change memory devices may include a semiconductor substrate of a first conductivity type and a plurality of parallel word lines disposed on the semiconductor substrate. The word lines may have a second conductivity type different from the first conductivity type and substantially flat top surfaces. First and second semiconductor patterns may be sequentially stacked on each word line, and an insulating layer may be provided to fill gap regions between the word lines, gap regions between the first semiconductor patterns and gap regions between the second semiconductor patterns. A plurality of phase change material patterns may be two-dimensionally arrayed on the insulating layer and electrically connected to the second semiconductor patterns.