The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 02, 2011
Filed:
Oct. 01, 2010
Olaf Conradi, Westhausen/Westerhofen, DE;
Boris Bittner, Roth, DE;
Sascha Bleidistel, Aalen, DE;
Markus Hauf, Ichenhausen, DE;
Wolfgang Hummel, Aalen, DE;
Arif Kazi, Aalen, DE;
Baerbel Schwaer, Aalen, DE;
Jochen Weber, Heidenheim, DE;
Hubert Holderer, Oberkochen, DE;
Payam Tayebati, Ulm, DE;
Olaf Conradi, Westhausen/Westerhofen, DE;
Boris Bittner, Roth, DE;
Sascha Bleidistel, Aalen, DE;
Markus Hauf, Ichenhausen, DE;
Wolfgang Hummel, Aalen, DE;
Arif Kazi, Aalen, DE;
Baerbel Schwaer, Aalen, DE;
Jochen Weber, Heidenheim, DE;
Hubert Holderer, Oberkochen, DE;
Payam Tayebati, Ulm, DE;
Carl Zeiss SMT GmbH, Oberkochen, DE;
Abstract
A projection objective of a microlithographic projection exposure apparatus comprises a manipulator for reducing rotationally asymmetric image errors. The manipulator in turn contains a lens, an optical element and an interspace formed between the lens and the optical element, which can be filled with a liquid. At least one actuator acting exclusively on the lens is furthermore provided, which can generate a rotationally asymmetric deformation of the lens.