The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 02, 2011
Filed:
Jul. 26, 2007
Shahid Rauf, Pleasanton, CA (US);
Kenneth S. Collins, San Jose, CA (US);
Kallol Bera, San Jose, CA (US);
Kartik Ramaswamy, San Jose, CA (US);
Hiroji Hanawa, Sunnyvale, CA (US);
Andrew Nguyen, San Jose, CA (US);
Steven C. Shannon, San Mateo, CA (US);
Lawrence Wong, Fremont, CA (US);
Satoru Kobayashi, Mountain View, CA (US);
Troy S. Detrick, Los Altos, CA (US);
James P. Cruse, Santa Cruz, CA (US);
Shahid Rauf, Pleasanton, CA (US);
Kenneth S. Collins, San Jose, CA (US);
Kallol Bera, San Jose, CA (US);
Kartik Ramaswamy, San Jose, CA (US);
Hiroji Hanawa, Sunnyvale, CA (US);
Andrew Nguyen, San Jose, CA (US);
Steven C. Shannon, San Mateo, CA (US);
Lawrence Wong, Fremont, CA (US);
Satoru Kobayashi, Mountain View, CA (US);
Troy S. Detrick, Los Altos, CA (US);
James P. Cruse, Santa Cruz, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
RF ground return current flow is diverted away from asymmetrical features of the reactor chamber by providing bypass current flow paths. One bypass current flow path avoids the pumping port in the chamber floor, and comprises a conductive symmetrical grill extending from the side wall to the grounded pedestal base. Another bypass current flow path avoids the wafer slit valve, and comprises an array of conductive straps bridging the section of the sidewall occupied by the slit valve.