The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 12, 2011
Filed:
Aug. 06, 2007
Yasutaka Toyoda, Hitachi, JP;
Takumichi Sutani, Hitachinaka, JP;
Ryoichi Matsuoka, Yotsukaido, JP;
Hidemitsu Naya, Hitachi, JP;
Yasutaka Toyoda, Hitachi, JP;
Takumichi Sutani, Hitachinaka, JP;
Ryoichi Matsuoka, Yotsukaido, JP;
Hidemitsu Naya, Hitachi, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
There is provided a pattern inspection apparatus that is capable of detecting a defect accurately and efficiently to inspect a pattern of a semiconductor device. The pattern inspection apparatus includes: a contour extraction means for extracting contour data of a pattern from a captured image of the semiconductor device; a non-linear part extraction means for extracting a non-linear part from the contour data; an angular part extraction means for extracting an angular part of a pattern from design data of the semiconductor device; and a defect detection section that compares a position of the non-linear part extracted by the non-linear part extraction section with a position of the angular part extracted by the angular part extraction section so as to detect a position of a defective part of a pattern.