The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 12, 2011
Filed:
Nov. 08, 2007
David Keith Carlson, San Jose, CA (US);
Satheesh Kuppurao, San Jose, CA (US);
Howard Beckford, San Jose, CA (US);
Herman Diniz, Fremont, CA (US);
Kailash Kiran Patalay, Santa Clara, CA (US);
Brian Hayes Burrows, San Jose, CA (US);
Jeffrey Ronald Campbell, San Francisco, CA (US);
Zouming Zhu, Santa Clara, CA (US);
Xiaowei LI, Austin, TX (US);
Errol Antonio Sanchez, Tracy, CA (US);
David Keith Carlson, San Jose, CA (US);
Satheesh Kuppurao, San Jose, CA (US);
Howard Beckford, San Jose, CA (US);
Herman Diniz, Fremont, CA (US);
Kailash Kiran Patalay, Santa Clara, CA (US);
Brian Hayes Burrows, San Jose, CA (US);
Jeffrey Ronald Campbell, San Francisco, CA (US);
Zouming Zhu, Santa Clara, CA (US);
Xiaowei Li, Austin, TX (US);
Errol Antonio Sanchez, Tracy, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A method and apparatus for delivering precursor materials to a processing chamber is described. The apparatus includes a gas distribution assembly having multiple gas delivery zones. Each zone may include a plenum having an inlet for receiving a precursor gas and at least one source of non-thermal energy, such as an infrared light source. The at least one source of non-thermal energy is may be varied to control the intensity of wavelengths from the infrared light source.