The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 31, 2011
Filed:
Jan. 25, 2008
Hiroyasu Shichi, Tokyo, JP;
Muneyuki Fukuda, Kokubunji, JP;
Yoshinori Nakayama, Sayama, JP;
Masaki Hasegawa, Sayama, JP;
Satoshi Tomimatsu, Kokubunji, JP;
Hiroyasu Shichi, Tokyo, JP;
Muneyuki Fukuda, Kokubunji, JP;
Yoshinori Nakayama, Sayama, JP;
Masaki Hasegawa, Sayama, JP;
Satoshi Tomimatsu, Kokubunji, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
An ion beam system includes a sample stage which holds a sample, an ion source which generates an ion beam so that the ion beam is extracted from the ion source along an extraction axis, an irradiation optical system having an irradiation axis along which the ion beam is irradiated toward the sample held on the sample stage, and a charged particle beam observation system for observing a surface of the sample which is machined by the irradiated ion beam. The extraction axis along which the ion beam is extracted from the ion source and the irradiation axis along which the sample is irradiated are inclined with respect to one another.