The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 24, 2011
Filed:
Mar. 28, 2007
Applicants:
Joerg Bischoff, Illmenau, DE;
David Hetzer, Dresden, DE;
Manuel Madriaga, San Jose, CA (US);
Inventors:
Assignee:
Tokyo Electron Limited, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F 15/18 (2006.01); G05B 17/00 (2006.01); G05B 23/00 (2006.01); G05B 13/00 (2006.01); G01J 3/28 (2006.01);
U.S. Cl.
CPC ...
Abstract
To train a machine learning system, a set of different values of one or more photoresist parameters, which characterize behavior of photoresist when the photoresist undergoes processing steps in a wafer application, is obtained. A set of diffraction signals is obtained using the set of different values of the one or more photoresist parameters. The machine learning system is trained using the set of measured diffraction signals as inputs to the machine learning system and the set of different values of the one or more photoresist parameters as expected outputs of the machine learning system.