The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 17, 2011
Filed:
Apr. 19, 2010
Sidlgata V. Sreenivasan, Austin, TX (US);
Byung-jin Choi, Austin, TX (US);
Norman E. Schumaker, Austin, TX (US);
Ronald D. Voisin, Fremont, CA (US);
Michael P. C. Watts, Austin, TX (US);
Mario Johannes Meissl, Austin, TX (US);
Sidlgata V. Sreenivasan, Austin, TX (US);
Byung-Jin Choi, Austin, TX (US);
Norman E. Schumaker, Austin, TX (US);
Ronald D. Voisin, Fremont, CA (US);
Michael P. C. Watts, Austin, TX (US);
Mario Johannes Meissl, Austin, TX (US);
Molecular Imprints, Inc., Austin, TX (US);
Abstract
Methods of forming continuous layers on regions of a substrate are described. Generally, an imprint lithography template may contact liquid positioned on the substrate. The liquid may be cured forming a masking layer, and the imprint lithography template separated from the masking layer. Prior to separation, pressurized gas and/or vacuum may be applied between the template and the substrate. Additionally, during separation, pressurized gas and/or vacuum may be applied between the template and the substrate.