The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 10, 2011
Filed:
Oct. 03, 2007
Anthony Mowry, Dresden, DE;
Bernhard Trui, Dresden, DE;
Maciej Wiatr, Dresden, DE;
Andreas Gehring, Dresden, DE;
Andy Wei, Dresden, DE;
Anthony Mowry, Dresden, DE;
Bernhard Trui, Dresden, DE;
Maciej Wiatr, Dresden, DE;
Andreas Gehring, Dresden, DE;
Andy Wei, Dresden, DE;
Globalfoundries Inc., Grand Cayman, KY;
Abstract
A new technique enables providing a stress-inducing alloy having a highly stress-inducing region and a region which is processable by standard processing steps suitable for use in a commercial high volume semiconductor device manufacturing environment. The regions may be formed by a growth process with a varying composition of the growing material or by other methods such as ion implantation. The highly stress-inducing region near the channel region of a transistor may be covered with an appropriate cover.