The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7939396 B1

PDF
Full Text
Expired
Date of Patent:
May. 10, 2011

Filed:

Jun. 09, 2006
Applicants:

Peng-fu Hsu, Hsinchu, TW;

Jin Ying, Singapore, SG;

Hun-jan Tao, Hsin-Chu, TW;

Inventors:

Peng-Fu Hsu, Hsinchu, TW;

Jin Ying, Singapore, SG;

Hun-Jan Tao, Hsin-Chu, TW;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/336 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method of forming a semiconductor structure includes providing a semiconductor substrate, performing a hydrogen annealing to the semiconductor substrate, forming a base oxide layer after the step of hydrogen annealing, and forming a high-k dielectric layer on the base oxide layer.


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