The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 12, 2011
Filed:
Aug. 28, 2001
Koji Miyata, Fukui, JP;
Jun Hirose, Yamanashi, JP;
Akira Kodashima, Miyagi, JP;
Shigeki Tozawa, Yamanashi, JP;
Kazuhiro Kubota, Yamanashi, JP;
Yuki Chiba, Miyagi, JP;
Koji Miyata, Fukui, JP;
Jun Hirose, Yamanashi, JP;
Akira Kodashima, Miyagi, JP;
Shigeki Tozawa, Yamanashi, JP;
Kazuhiro Kubota, Yamanashi, JP;
Yuki Chiba, Miyagi, JP;
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
In a magnetic field generator for magnetron plasma generation which comprises a dipole-ring magnet with a plurality of columnar anisotropic segment magnets arranged in a ring-like manner, or in an etching apparatus and a method both of which utilize the magnetic field generator, the uniformity of plasma treatment over the entire surface of a wafer (workpiece) is improved by controlling the direction of the magnetic field relative to the working surface of the wafer (workpiece) which is subject to plasma treatment such as etching.