The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 05, 2011
Filed:
May. 23, 2008
Robert D. Allen, San Jose, CA (US);
Phillip Joe Brock, Sunnyvale, CA (US);
Blake W. Davis, Hollister, CA (US);
Geraud Jean-michel Dubois, Los Gatos, CA (US);
Qinghuang Lin, Yorktown Heights, NY (US);
Robert D. Miller, San Jose, CA (US);
Alshakim Nelson, Fremont, CA (US);
Sampath Purushothaman, Yorktown Heights, NY (US);
Ratnam Sooriyakumaran, San Jose, CA (US);
Robert D. Allen, San Jose, CA (US);
Phillip Joe Brock, Sunnyvale, CA (US);
Blake W. Davis, Hollister, CA (US);
Geraud Jean-Michel Dubois, Los Gatos, CA (US);
Qinghuang Lin, Yorktown Heights, NY (US);
Robert D. Miller, San Jose, CA (US);
Alshakim Nelson, Fremont, CA (US);
Sampath Purushothaman, Yorktown Heights, NY (US);
Ratnam Sooriyakumaran, San Jose, CA (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A method and a composition. The composition includes at least one carbosilane-substituted silsesquioxane polymer which crosslinks in the presence of an acid. The at least one carbosilane-substituted silsesquioxane polymer is soluble in aqueous base. The method includes forming a coating on a substrate. The coating includes one or more carbosilane-substituted silsesquioxane polymers. The carbosilane-substituted silsesquioxane polymer is soluble in aqueous base. The coating is exposed to radiation, resulting in generating a latent pattern in the coating. The exposed coating is baked at a first temperature less than about 150° C. The baked coating is developed, resulting in forming a latent image from the latent pattern in the baked coating. The latent image is cured at a second temperature less than about 500° C.