The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 29, 2011

Filed:

Mar. 04, 2005
Applicants:

Michael Albert, Stamford, CT (US);

Damian Fiolka, Oberkochen, DE;

Inventors:

Michael Albert, Stamford, CT (US);

Damian Fiolka, Oberkochen, DE;

Assignees:

Carl Zeiss SMT GmbH, Oberkochen, DE;

ASML Holding NV, Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 27/28 (2006.01);
U.S. Cl.
CPC ...
Abstract

A polarization pattern assembly for use in an illuminator and an apparatus for providing at least one polarization pattern in a pupil of an illuminator for a lithography system are provided. A polarization pattern assembly for use in an illuminator having a pupil includes a frame () and at least one polarization pane () coupled to the frame (), the polarization pane () changing a direction of polarization of light passing therethrough, whereby at least one polarization pattern is obtained across the pupil of the illuminator, and wherein the polarization pane () includes an optically active material.


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