The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 22, 2011

Filed:

Mar. 27, 2008
Applicants:

Houssam Jomaa, Phoenix, AZ (US);

Amruthavalli P. Alur, Chandler, AZ (US);

Dilan Seneviratne, Chandler, AZ (US);

Inventors:

Houssam Jomaa, Phoenix, AZ (US);

Amruthavalli P. Alur, Chandler, AZ (US);

Dilan Seneviratne, Chandler, AZ (US);

Assignee:

Intel Corporation, Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C25D 5/34 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method of manufacturing a substrate for a microelectronic device comprises providing a dielectric material () as a build-up layer of the substrate, applying a primer () to a surface () of the dielectric material, and forming an electrically conductive layer () over the primer. In another embodiment, the method comprises providing the dielectric material, forming the feature extending into the dielectric material, forming the electrically conductive layer over the dielectric material, applying the primer to a surface of the electrically conductive layer and attaching a dielectric layer () to the primer.


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